This site is dedicated to Pulsed Laser Deposition (PLD) technique.

Pulsed laser deposition is a technique for creating thin films.

The PLD method of thin film growth involves evaporation of a solid target in an Ultra High Vacuum chamber by means of short and high-energy laser pulses. In a typical PLD process, a researcher places a ceramic target in a vacuum chamber. A pulsed laser beam vaporizes the surface of the target, and the vapor condenses on a substrate. The main components are a laser, optics, and a vacuum system.

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